Turnaround time (TAT) for photomask makers has historically increased at smaller and smaller process nodes, as reported in the eBeam Initiative Mask Makers surveys, so it’s important to look at the ...

The time it takes to write a photomask with curvilinear shapes was a major historical barrier to adoption inverse lithography technology (ILT), as discussed in the second installment of our blog ...

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Scientists have developed a scanning transmission electron microscopy method that can quickly and efficiently generate 3-D representations of curvilinear nanostructures. Physical and biological ...

(Nanowerk News) An international team of scientists from Austria and Germany has launched a new paradigm in magnetism and superconductivity, putting effects of curvature, topology, and 3D geometry ...